Project information
Study of hybrid deposition process and its application for thin film deposition
- Project Identification
- GP202/08/P038
- Project Period
- 1/2008 - 12/2010
- Investor / Pogramme / Project type
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Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
- Keywords
- magnetron sputtering, hybrid PVD-PECVD, hysteresis behaviour, thin film deposition, nanocomposite, BCN
This project focuses on investigation of behaviour of hybrid PVD-PECVD process, which will be used for preparation of nanocomposite n-Ti:C/a-C:H and a-BCN:H materials. In this hybrid deposition process, a gaseous hydrocarbon will be used as a source of carbon instead of its conventional sputtering from magnetron target. Hysteresis behaviour of this process together with properties of deposited thin films will be investigated and compared with those of PVD process. Comparative study for two types of hydrocarbons will be performed. Advanced model of reactive sputtering assuming nonuniform discharge current density will be developed. This model will be extended to accommodate the interaction of gaseous hydrocarbon with all surfaces in the deposition chamber.
Publications
Total number of publications: 37
2009
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Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process
Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes, year: 2009
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Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process
Year: 2009, type: Conference abstract
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Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, year: 2009
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Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, year: 2009
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Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously
Year: 2009, type: Conference abstract
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Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, year: 2009
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Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
Plasma Sources Science and Technology, year: 2009, volume: 18, edition: 2
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Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously
Year: 2009, type: Conference abstract
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Suppressed hysteresis behaviour of titanium sputtering in acetylene gas.
Year: 2009, type: Conference abstract
2008
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Advanced modeling of reactive sputtering process with non-linear discharge current density
Chemické Listy, year: 2008, volume: 102, edition: 1